This is the state-of-the-art foundation for ASML's next-generation TWINSCAN NXE:3800E EUV system. This intricate machine base is engineered for extreme stiffness and thermal stability, creating an ultra-precise and vibration-free environment. The design features a complex, multi-level top plate with specific interfaces and clearance zones, perfectly matched to the layout of the new, higher-productivity EUV scanner. Its dense array of advanced support stanchions provides the uncompromising stability required to enable higher-NA optics and achieve the aggressive performance targets of leading-edge chip manufacturing.