Custom Pedestal for EUV Lithography Platforms

Overview

Tool Platform: TWINSCAN NXE:3600

Solution: Dual-structure, seismically isolated pedestal

Primary Benefit: Exceptional stability and vibration damping

Application: High-volume manufacturing of advanced logic and memory devices

Customer & Application

Fulcrum engineered a custom pedestal for the ASML TWINSCAN NXE:3600 EUV lithography platform, a cornerstone tool for advanced semiconductor production. The pedestal was designed to support both the core imaging system and sensitive material handling components, each with distinct structural and vibration-control requirements.

Challenge: Supporting Complex EUV Tool Architectures

The NXE:3600 platform presented a unique challenge: a single machine base needed to deliver absolute stability across multiple tool subsystems with differing sensitivity profiles. The primary imaging system required a massive, rigid foundation, while adjacent components demanded seismic isolation and vibration decoupling. Any unwanted motion could negatively impact overlay accuracy, throughput, or long-term tool reliability in high-volume manufacturing environments.

Fulcrum’s Engineered Solution

Fulcrum developed a sophisticated dual-structure pedestal that combines a heavily reinforced, enclosed main body with an open-frame, seismically isolated section. This hybrid design allows each portion of the NXE:3600 tool to be supported according to its specific performance requirements. A network of adjustable footings and a robust structural framework provide fine-tuned leveling, load distribution, and vibration control, resulting in a rock-solid foundation optimized for EUV lithography.