This sophisticated, dual-structure machine base is custom-engineered for the ASML TWINSCAN NXE:3600 EUV lithography platform. The design masterfully combines a massive, enclosed main body for the primary system with an open-frame, seismically isolated section for sensitive components. This hybrid approach ensures exceptional stability and vibration damping across the entire tool, accommodating the precise requirements of both the core imaging and material handling modules. The numerous adjustable footings and robust framework provide the rock-solid foundation necessary for the reliable, high-volume production of advanced logic and memory chips.