This robust machine base is engineered to provide exceptional stability for the Canon FPA-5550iZ2 i-line stepper. Its compact, heavily reinforced design creates a solid, vibration-resistant platform essential for high-precision lithography. The distinctive notched corner and precision-machined top surface are custom-tailored to the specific footprint and interface points of the 5550iZ2 system, ensuring perfect alignment and optimal performance during critical wafer exposure processes.