Compact Pedestal for Metrology & Inspection Systems
ASML S-500-600
Overview
Tool Platform: 500 and 600 series metrology and inspection systems
Solution: Compact, cube-style precision pedestal
Primary Benefit: Exceptional rigidity and operational stability in a minimal footprint
Application: Semiconductor metrology and inspection environments
Customer & Application
Fulcrum engineered a custom machine base pedestal for a leading semiconductor equipment manufacturer, supporting advanced metrology and inspection platforms developed by ASML. The pedestal was designed to deliver a highly stable, space-efficient foundation for sensitive optical and wafer handling systems while maintaining accessibility for service and integration within fab environments.
Challenge: Stability and Access in a Compact Footprint
The 500 and 600 series metrology systems required a machine base that could deliver exceptional stiffness and vibration control without increasing the overall tool footprint. In addition to structural performance, the pedestal needed to support routine access to internal components for service and integration. Any compromise in rigidity or alignment could negatively impact measurement accuracy and tool reliability.
Fulcrum’s Engineered Solution
Fulcrum developed a robust, cube-like pedestal engineered for maximum rigidity within a compact footprint. Reinforced side walls provide structural stiffness, while integrated access panels enable efficient serviceability. The precision-machined top plate features carefully planned apertures and mounting patterns that seamlessly integrate sensitive optical columns and wafer-handling components. This combination of structural strength and thoughtful accessibility ensures long-term operational stability without sacrificing usability.
Results
Delivered a rigid, vibration-resistant foundation for metrology and inspection tools
Enabled precise integration of optical and wafer handling components
Maintained service accessibility within a compact pedestal footprint
Supported reliable, repeatable performance in high-precision fab environments